Additive Manufacturing of Cupric Oxide via Direct Ink Writing

Fabricación aditiva de óxido cúprico mediante escritura directa con tinta

Fabricação aditiva de óxido cúprico por escrita direta de tinta

Ali, Muhammad - Khan, Shaheryar A. - Shah, Aqueel - Najib, Antash - Hussain, Abbas
Detalles Bibliográficos
2026
Cerámica avanzada
Impresión directa con tinta
Fabricación aditiva
Óxido de cobre
Óxido cúprico
Aglutinante
Cerámica
Cuerpo verde
Cuerpo marrón
Cerámica sinterizada
Análisis de resistividad de cerámica
Suspensión acuosa de aglutinante
Suspensión con partículas
Advanced Ceramics
Direct Ink Writing
Additive Manufacturing
Copper Oxide
Cupric Oxide
Binder
Ceramics
Green Body
Brown Body
Sintered Ceramic
Resistivity Analysis of Ceramic
Aqueous Binder Slurry
Particle Laden Slurry
Cerâmicas Avançadas
Impressão Direta de Tinta
Manufatura Aditiva
Óxido de Cobre
Óxido Cúprico
Aglutinante
Cerâmicas
Corpo Verde
Corpo Marrom
Cerâmica Sinterizada
Análise de Resistividade de Cerâmica
Suspensão Aquosa de Aglutinante
Suspensão com Partículas
Español
Universidad de Montevideo
REDUM
https://revistas.um.edu.uy/index.php/ingenieria/article/view/1966
https://hdl.handle.net/20.500.12806/3440
Acceso abierto
Atribución 4.0 Internacional
Resumen:
Sumario:The DIW approach offers numerous benefits, including expedited prototyping, cost-effectiveness, reduced waste in manufacturing, and enhanced design flexibility. It's currently a popular production method for building materials and has great potential for porous and electronic materials. In this study, porous cupric oxide (CuO) ceramics were fabricated using a direct ink writing (DIW) approach based on a copper particle–laden aqueous precursor. The ink formulation was optimized to achieve stable extrusion and crack-free green bodies, yielding a final composition of 68.0 wt% Cu, 31.3 wt% water, and 0.6 wt% CMC. Following oxidation and sintering in air, the printed structures exhibited a bulk density of 3.60 ± 0.20 g cm⁻³ and a corresponding theoretical porosity of 43.7 ± 0.9%. X-ray diffraction confirmed nearly phase-pure monoclinic CuO with no detectable Cu or Cu₂O residues. The printed components exhibited an interconnected, porous microstructure and a four-point-probe resistivity of 10.5 ± 0.3 Ω·m at 25 °C, reflecting the influence of high porosity on charge transport. The DIW route demonstrated here provides a controllable pathway for producing porous CuO architectures with tunable microstructure and moderate electrical conductivity. These characteristics suggest potential applicability in gas filtration, catalytic supports, and electrochemical sensing; however, device-level validation is still required to fully assess functional performance.